MoleCure Beam Epitaxy (MB) nubuhanga busobanutse neza kandi busobanutse neza hamwe na porogaramu zinyuranye, harimo na semiconductutor ya semiconductor, Optoelectronics, hamwe no kubara. Imwe mu mbogamizi zingenzi muri sisitemu ya Mbe ni ugukomeza ubushyuhe buke cyane, nibyovacuum jacketies (vjp) biza gukina. Iyi miyoboro yateye imbere ni ngombwa mu kubungabunga ubushyuhe mu byumba bya MBE, bikabakorera ikintu cyingenzi mu kugera ku mikurire yuburyo bwo hejuru bwibikoresho kurwego rwa atome.
MBE is a deposition technique that involves the controlled deposition of atomic or molecular beams onto a substrate in a high-vacuum environment. Inzira isaba kugenzura ubushyuhe busobanutse kugirango igere ku mitungo yifuzwa, ituma icumbi ryumuriro ikintu gikomeye. Muri sisitemu ya Mbe,
Ibyiza byo gukoresha imiyoboro ya Jackeim muri Techna tekinoroji ya Mbe
Ikoreshwa ryain MBE technology offers several advantages. First, they ensure the precise thermal control required for high-quality thin film deposition, which is crucial for achieving uniform material growth. Second, they help to reduce the risk of contamination in the MBE environment by maintaining the integrity of the vacuum. Ubwanyuma,
Igihe cyohereza: Nov-28-2024
